Compositional Investigation of Nano-patterned Si Surface Induced by Metal-assisted Ion Beam Sputtering: An Advanced Study

Using low energy ion beam sputtering at normal incidence and stainless steel as seeding material for varied sputtering periods at room temperature, fabrication of nano-patterned Si surfaces with simultaneous metal co-deposition is demonstrated. The nano-patterned surfaces created with an ion beam at such a low energy range are being investigated as prospective candidates in a variety of nano-technological domains. From morphological study, the evolution of nano-dot topography on the Si surface has been observed. Using X-rays to investigate chemical states The presence of metal impurities such as Fe and Cr emanating from the stainless steel target is shown by photoelectron spectroscopy (XPS). The identified elements’ high-resolution XPS core level spectra are analysed, and subsequent analysis of their compositional details suggests that metal-oxide and metal-silicide development on the sample surface.

Author (S) Details

Anindita Deka
Saha Institute of Nuclear Physics, 1/AF Bidhan Nagar, Kolkata-700064, India.

Pintu Barman
Saha Institute of Nuclear Physics, 1/AF Bidhan Nagar, Kolkata-700064, India.

Prof. Satyaranjan Bhattacharyya
Saha Institute of Nuclear Physics, 1/AF Bidhan Nagar, Kolkata-700064, India.

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