Scanning Electron Microscopy Analysis of Thin Films: A Review

Thin films maybe used in solar cell, ray of light devices, optical waveguides, optoelectronic instruments and temperature sensors. These films were deposited utilizing various methods to a degree sputtering, chemical usually deposition method, electro dethroning method, pulsed ray of light deposition, vacuum dissolution, thermal evaporation, spray pyrolysis, e-beam dissolution, chemical vapor dethroning and spin coating method. Characterization of the acquired films could be studied through radioactivity photoelectron spectroscopy, x-ray dissemination, Raman spectrometry, Rutherford Backscattering spectrometry, atomic force microscopy, UV-Visible spectroscopy, transmission energized matter microscopy, scanning electron microscopy (SEM) and strength dispersive X-ray analysis. The SEM technique take care of produce images by scanning the surface of the samples accompanying focused electron beam. These electrons must communicate with atoms (in the prepared films), produce various signals, contained very important facts such as surface topography and arrangement. The SEM could reach resolution better than 1 nanometer, and the examples could be detected indifferent environments (high emptiness, low vacuum or wet environments). In this work, the morphological of the prepared films was stated based on the selected history review. It was shown that grain content, thickness and grain shape powerfully depended on the specific environments.

Author(s) Details:

Ho Soon Min,
Faculty of Health and Life Sciences, INTI International University Putra Nilai, 71800, Nilai, Negeri Sembilan, Malaysia.

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Keywords: Thin films, scanning electron microcopy, morphology, uniform surface, grain size

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